Fudzilla

ASML nearly ready to ship first EUV lithography scanner

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 ...
TweakTown

ASML ships industry's first High-NA EUV lithography scanner to Intel

ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...
SDxCentral

Intel receives its High-NA EUV scanner from ASML

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

ASML Holding (ASML)’s Shares Upgraded On Back Of Latest Chipmaking Machines

We recently published 13 Best Semiconductor Equipment Stocks to Buy According to Hedge Funds. ASML Holding N.V. (NASDAQ:ASML) ...
TechSpot

ASML just shipped its first next-gen EUV machine to Intel

Highly anticipated: ASML specializes in manufacturing photolithography machines used to etch computer chips out of silicon wafers. The Dutch corporation is, indeed, the most highly valued European ...

American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass A…

A U.S. startup is developing a compact particle-accelerator-based X-ray lithography system that could surpass ASML's EUV ...
sciencex

Entering the High NA EUV Lithography era

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].
Yahoo

ASML to Ship First High-NA EUV Tool This Year: $300 Million per Scanner

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year, the company's chief executive said this week. ASML's Twinscan ...
Digi Times

Imec showcases High-NA EUV breakthroughs as joint lab with ASML soon becomes operational

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...
AZoNano

EUV Tech, Inc. Introduces HVM-Ready EUV Zoneplate Microscopy for Mask Defect Review

EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...
Optics

ASML and imec open high-NA EUV lithography lab

The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...
Semiconductor Engineering

Manufacturing Bits: Oct. 5

At the recent SPIE Photomask Technology + EUV Lithography conference, Japan’s High Energy Accelerator Research Organization (KEK) presented a paper on its latest efforts to develop a free-electron ...